CAMECA Logo
Worldwide contacts - Service & Support
Search


Home
AMETEK Materials Analysis Division
CAMECA Semiconductor Applications
Path: Home>Applications>Semiconductors>Dopant Monitoring
Depth Profiling

Deep and shallow depth profiling (SIMS)

In semiconductor technology, materials and thus analytical problems change rapidly. Thanks to its outstanding depth profiling capabilities, the CAMECA IMS 7f-Auto is widely used for dopant monitoring in the semiconductor industry, and applied to different species and material systems. Among its instrumental advantages: two high brightness ions sources (Cs+ and O2+), high transmission, high mass resolution…

Phosphorus in silicon depth profileExcellent detection limits for deep implants

For deep implants, depth profiles up to several microns in-depth can be analyzed within minutes, with impressive sensitivity and high dynamic range. For the three main Si dopants (B, P and As), a detection limit in the ppb range can be achieved. Opposite to TOF-SIMS, the detection limits are improved in the IMS 7f-Auto when increasing sputtering speed.

Phosphorus in silicon:
High sample throughput for deep implants. A sputter rate higher than 0.5µm/min, and a detection limit of 5x1013 at/cm3 (1ppb) are shown. High Mass Resolution is used to separate 30SiH from 31P.



Optimized depth resolution for shallow implants

ULE Depth Profiling with IMS 7fOn the CAMECA IMS 7f-Auto, the impact energy can be continuously reduced down to 500eV, providing excellent depth resolution while keeping good sensitivity. Therefore, the IMS 7f-Auto can be used for characterizing the in-depth distribution of dopants and impurities on shallow implanted samples or thin layer structures.

Ultra shallow implant technology:
ultra low energy (O2+ 500V) depth profiling
 for investigation on annealing conditions


CAMECA IMS 7f-Auto
SIMS

APPLICATION EXAMPLES

LITERATURE

instruments for research - metrology tools - applications - user publications - news - conferences - company - locations

Atom Probe Tomography (APT) - SIMS - EPMA - LEXES - ICP-MS - GD-MS - TIMS

© 2010-2016 AMETEK, Inc - CAMECA SAS. All Rights Reserved - www.ametek.com
privacy - trademarks - sitemap