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MPI-E order confirms success of new LEAP 5000 Atom Probe
Feb. 2015: MPI-E (Max Planck Institute-Eisenforschung, Dusseldorf, Germany) has become one of the first to purchase a LEAP 5000 XS instrument for their famous Research Group for Atom Probe Tomography.

The new instrument will join their existing CAMECA LEAP 3000X HR (installed in 2010) in analysis of high-strength alloys, semiconductor devices, thin-film solar cells, and LED materials. Dr. Dierk Raabe and Dr. Pyuck-Pa Choi have established an outstanding group of scientists who in turn have employed their LEAP system in producing numerous scientific papers and research highlights since adopting the technology.

The MPI-E LEAP atom probe has been mainly used to study materials interface phenomena such as segregation and partitioning at grain and/or phase boundaries. Main applications include studying the local thermo-dynamic and kinetic behavior of high-strength steels and other structural materials such as Ni- and Co-based superalloys, and the structure-property relationships of semiconductor materials for photovoltaic applications. The latter is done in close collaboration with another MPIE research group dedicated to interfaces in solar cells led by Dr. O. Cojocaru-Mirédin.

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